Course Content (Syllabus)
Physical Vapor Deposition (PVD) Techniques: Evaporation techniques (thermal evaporation, e-beam evaporation, evaporation devices technology), sputtering techniques (rf & dc sputtering, magnetron sputtering, reactive sputtering), ion beam and ion assisted deposition techniques, geometry and technology of plasma and ion beam, molecular epitaxy (molecular epitaxy conditions, ion beams and Knudsen). Installations of large scale deposition and roll-to-roll. Surface treatment using plasma and ion beams. Ion-mater interaction and surface processes (chemical and physical). Chemical Vapor Deposition (CVD), physical chemistry of surfaces and selective CVD. Measurement and monitoring techniques and methods for thin films and nano-layers. Thin films applications (for surface protection, photovoltaics, packaging, displays etc.). Laboratory familiarization and practice in deposition and measurement devices.