Upon completion of the course the students will be familiar with the correlation between the processing (implantation, diffusion and oxidation) and the macroscopic properties of the final product. In addition to that they will have studied application of the above processing techniques in metal, micro- and optoelectronics industries as well as in medical applications. Furthermore, the students will methods for the growth of thin film or multilayered magnetic materials and their structural and electronic properties. Finally they will study their potential applications in commercial products.
Course Content (Syllabus)
Ion implantation for the modification of materials surface properties and fabrication of novel metastable compounds. Implanters. Ion distribution and lattice damage. Multiple implants, masking, tunneling. Methods of annealing for the recovery of the lattice damage and dopant activation. Applications of ion implantation in micro- and optoelectronics, biocompatible implants and metals. Diffusion. Oxidation: kinetics and oxidation mechanisms, effects of impurity concentration and crystallographic orientation. Methods from the determination of the implant distribution (AES, XPS, SIMS). Photolithography and its recent modifications for the top-down fabrication of nanostructures.
PVD growth of magnetic thin films and multilayers. Structural, magnetic, electric, magneto-optic characterization of magnetic multilayers. Phenomena and properties related to the multilayered structure. Developments and applications of magnetic multilayers.