THIN FILMS & SURFACE TREATMENT TECHNOLOGY

Course Information
TitleΤΕΧΝΟΛΟΓΙΑ ΛΕΠΤΩΝ ΥΜΕΝΙΩΝ ΚΑΙ ΕΠΙΦΑΝΕΙΑΚΗΣ ΚΑΤΕΡΓΑΣΙΑΣ / THIN FILMS & SURFACE TREATMENT TECHNOLOGY
CodeΜΝΝ306
FacultySciences
SchoolPhysics
Cycle / Level2nd / Postgraduate
Teaching PeriodWinter
CommonNo
StatusActive
Course ID40000173

Class Information
Academic Year2017 – 2018
Class PeriodWinter
Faculty Instructors
Instructors from Other Categories
Weekly Hours3
Class ID
600112135
Course Type 2016-2020
  • Background
  • General Knowledge
  • Scientific Area
Course Type 2011-2015
Specific Foundation / Core
Mode of Delivery
  • Face to face
Digital Course Content
Language of Instruction
  • Greek (Instruction, Examination)
Course Content (Syllabus)
Physical Vapor Deposition (PVD) Techniques: Evaporation techniques (thermal evaporation, e-beam evaporation, evaporation devices technology), sputtering techniques (rf & dc sputtering, magnetron sputtering, reactive sputtering), ion beam and ion assisted deposition techniques, geometry and technology of plasma and ion beam, molecular epitaxy (molecular epitaxy conditions, ion beams and Knudsen). Installations of large scale deposition and roll-to-roll. Surface treatment using plasma and ion beams. Ion-mater interaction and surface processes (chemical and physical). Chemical Vapor Deposition (CVD), physical chemistry of surfaces and selective CVD. Measurement and monitoring techniques and methods for thin films and nano-layers. Thin films applications (for surface protection, photovoltaics, packaging, displays etc.). Laboratory familiarization and practice in deposition and measurement devices.
Last Update
01-12-2014